µn¤J
¡U
µù¥U
¡U
·|û¤¤¤ß
¡U
µ²±b
¡U
°ö°V½Òµ{
Å]ªk§Ì¤l
¡U
¦Û¸ê¥Xª©
¡U
¹q¤l®Ñ
¡U
«ÈªA¤¤¤ß
¡U
´¼¼z«¬¥ßÊ^·|û
®Ñ¦W
¥Xª©ªÀ
§@ªÌ
isbn
½s¸¹
5050Å]ªk²³Äw
|
NG®Ñ«°
|
°ê»Ú¯Å«~µP½Òµ{
|
Àu´f³qª¾
|
ÅRÆE^¶¯µ¼Öºë¿ï
|
89S51/52 ³æ´¹¤ù»P±MÃD»s§@³Ì¨Î½d¥»¡G¨Ï¥ÎKeil(ªþ½d¨Òµ{¦¡ÀɮפÎKeil C³nÅé)
¡D
³s¦æ¾P°¤~¤]¨ØªAªº7
¡D
¸Ô¸Ñ¥b¾ÉÅéIC¥Î»yÃã
¡D
·P´ú¾¹À³¥Î¹q¸ôªº³]p
¤å¾Ç¤p»¡
¤å¾Ç
¡U
¤p»¡
°ÓºÞ³Ð§ë
°]¸g§ë¸ê
¡U
¦æ¾P¥øºÞ
¤H¤åÃÀ§{
©v±Ð¡Bõ¾Ç
ªÀ·|¡B¤H¤å¡B¥v¦a
ÃÀ³N¡B¬ü¾Ç
¡U
¹q¼vÀ¸¼@
Ày§Ó¾i¥Í
ÂåÀø¡B«O°·
®Æ²z¡B¥Í¬¡¦Ê¬ì
±Ð¨|¡B¤ß²z¡BÀy§Ó
¶i׾Dzß
¹q¸£»Pºô¸ô
¡U
»y¨¥¤u¨ã
Âø»x¡B´Á¥Z
¡U
x¬F¡Bªk«ß
°Ñ¦Ò¡B¦Ò¸Õ¡B±Ð¬ì¥Î®Ñ
¬ì¾Ç¤uµ{
¬ì¾Ç¡B¦ÛµM
¡U
¤u·~¡B¤uµ{
®a®x¿Ë¤l
®a®x¡B¿Ë¤l¡B¤H»Ú
«C¤Ö¦~¡Bµ£®Ñ
ª±¼Ö¤Ñ¦a
®È¹C¡B¦a¹Ï
¡U
¥ð¶¢®T¼Ö
º©µe¡B´¡¹Ï
¡U
¨î¯Å
¥b¾ÉÅé»s³y¸Ë¸m¥Î»yÃã¨å¡]×qª©¡^
§@ªÌ¡G
孫清µØ
¤ÀÃþ¡G
¤u·~¡E¤uµ{
¡þ
¹q¤l¡E¹q¾÷
¥Xª©ªÀ¡G
¥þµØ¹Ï®Ñ
¥Xª©¤é´Á¡G2000/3/1
ISBN¡G9572127470
®ÑÄy½s¸¹¡Gsb0052177
¶¼Æ¡G792
©w»ù¡G
590
¤¸
Àu´f»ù¡G
88
§é
519
¤¸
®Ñ»ùY¦³²§°Ê¡A¥H¥Xª©ªÀ¹ê»Ú©w»ù¬°·Ç
µ´ª©®Ñ
µ´ª©®Ñ¡G½T©w¤£¦Aª©ªº°Ó«~¡A¶È´£¨Ñ®ÑÄy¸ê°T°Ñ¦Ò¡C
µû»ù¼Æ¡G
(½Ð±N·Æ¹«²¾¦Ü¬P¬P³B¶i¦æµû»ù)
¥Ø«e¥§¡µû»ù¡G
¤å¦r³sµ²
½Æ»s»yªk
¥b¾ÉÅé»s³y¸Ë¸m¥Î»yÃã¨å¡]×qª©¡^
¹Ï¤ù³sµ²
½Æ»s»yªk
¤À
¨É
¤º®e²¤¶
¦PÃþ±ÀÂË
● 內容簡介 ●
本書之用»y³£«新推敲¹L¡A並將總收¿ý用»y整合為2400句¡A其用»y涉及¹q子¡B機械¡B化學¡B光學¡B真空¡B印刷¡B材料以及環保工程等極為廣泛之產業»â域¡A是一本綜合性Ãã典¡C全書以系統化排列並以ªí格方式依序編寫¦Ó成¡A幫助ŪªÌ¨³³t了¸Ñ和吸收¡C
■ 目¿ý
第一章¡@半導Åé»s程流程圖ªí»P¸Ë置用»y之構成 A¡@³]p工程用»y之構成1-3 B 光罩»s作工程用»y之構成1-4 C¡@晶圓»s³y工程用»y之構成1-5 D¡@晶圓³B理工程用»y之構成1-6 E¡@¸Ë°t工程用»y之構成1-7 F¡@檢查工程用»y之構成1-8 G¡@³]備¡D環保工程用»y之構成1-9 第二章¡@³]p工程用»y A1.¡@基本¡B共³q用»y2-3 1.1¡@基本用»y2-3 1.2¡@LSI之³]p方式用»y2-7 1.3¡@標準化¡B³W格化用»y2-13 1.4¡@方式用»y2-16 A2.¡@上游³]p¡B合成¡B功¯à檢查用»y2-21 2.1¡@工具用»y2-21 2.2¡@方式用»y2-25 A3.¡@ÅÞ¿è¡B¹q¸ô³]p用»y2-31 3.1¡@工具用»y2-31 3.2¡@方式用»y2-35 A4.¡@°t置³]p¡B查ÃÒ用»y2-41 4.1¡@工具用»y2-41 4.2¡@方式用»y2-44 4.3¡@查ÃÒ用»y2-49 A5.¡@測¸Õ³]p用»y2-51 5.1¡@工具用»y2-51 5.2¡@方式用»y2-52 5.3¡@可測¸Õ性³]p用»y2-57 第三章¡@¾B光罩»s作工程用»y B.1¡@基本¡B共³q用»y3-3 B.2¡@空白¾B光罩»s³y¸Ë置用»y3-15 2.1¡@洗滌乾燥¸Ë置用»y3-17 2.2¡@Á¡½¤形成¸Ë置用»y3-18 2.3¡@檢查¸Ë置用»y3-18 2.4¡@抗»k劑塗敷¸Ë置用»y3-20 2.5¡@烘烤¸Ë置用»y3-20 B3.¡@圖案形成¸Ë置用»y3-20 3.1¡@曝光¡B描畫¸Ë置用»y3-21 3.3¡@Åã影¡B烘烤¡B去浮渣¸Ë置用»y3-52 3.4¡@»k刻¡B剝Â÷¸Ë置用»y3-53 3.5¡@洗滌¡B乾燥¸Ë置用»y3-53 B4.¡@檢修¸Ë置用»y3-54 4.1¡@缺³´檢查¸Ë置用»y3-56 4.2¡@缺³´檢修¸Ë置用»y3-60 4.3¡@線寬¡B座標測¸Õ¸Ë置用»y3-65 B.5¡@檢查µû價¸Ë置用»y3-71 5.1¡@外物¡B外Æ[檢查¸Ë置用»y3-71 5.2¡@¶K上³n片¡B檢查¸Ë置用»y3-72 第四章¡@晶圓»s³y工程用»y C1.¡@基本¡B共³q用»y4-3 1.1¡@共³q用»y4-3 1.2¡@材料用»y4-5 C.2¡@單結晶»s³y用»y4-9 2.1¡@單結晶»s³y¸Ë置用»y4-9 2.2¡@單結晶»s³y¸Ë置-型式用»y4-12 2.3¡@單結晶»s³y¸Ë置-性¯à‧精確度用»y4-14 2.4¡@單結晶»s³y¸Ë置-硬Åé功¯à用»y4-16 2.5¡@結晶成ªø用»y4-22 C.3¡@機械加工用»y4-26 3.1¡@研磨¸Ë置用»y4-26 3.2¡@研磨¸Ë置-型式用»y4-27 3.3¡@研磨¸Ë置-硬Åé功¯à用»y4-27 3.4¡@研磨¸Ë置-加工用»y4-31 3.5¡@切斷¸Ë置用»y4-35 3.6¡@切割¸Ë置-型式用»y4-37 3.7¡@切斷¸Ë置-硬Åé功¯à用»y4-38 3.8¡@切斷¸Ë置-加工用»y4-46 3.9¡@去¨¤取±¸Ë置及其加工用»y4-48 C.4¡@磨光(lapping)用»y4-52 4.1¡@磨光¸Ë置用»y4-52 4.2¡@磨光¸Ë置-型式用»y4-53 4.3¡@磨光¸Ë置-性¯à¡B精確度用»y4-54 4.4¡@磨光¸Ë置-硬Åé功¯à用»y4-54 4.5¡@磨光¸Ë置-加工用»y4-56 C.5¡@拋光(polishing)用»y4-57 5.1¡@拋光¸Ë置用»y4-57 5.2¡@拋光¸Ë置-型式用»y4-59 5.3¡@拋光¸Ë置-性¯à¡B精確度用»y4-59 5.4¡@拋光¸Ë置-硬Åé功¯à用»y4-60 5.5¡@拋光¸Ë置-加工用»y4-63 C.6¡@熱³B理用»y4-65 6.1¡@熱³B理¸Ë置用»y4-65 6.2¡@熱³B理用»y4-65 C7.¡@檢查用»y4-69 7.1¡@物性檢查¸Ë置用»y4-69 7.2¡@特性用»y4-81 7.3¡@形狀¸Ë置用»y4-89 7.4¡@形狀用»y4-91 7.5¡@ªí±傷痕¡B外物檢查用»y4-102 第五章¡@晶圓³B理工程用»y D.1¡@基本¡B共³q用»y5-3 D.2¡@Á¡½¤形成用»y5-15 2.1¡@真空»]Áá¸Ë置用»y5-19 2.2¡@濺Áá¸Ë置用»y5-23 2.3¡@CVD¸Ë置用»y5-29 2.4¡@磊晶生ªø¸Ë置用»y5-39 D.3¡@氧化用»y5-44 D.4¡@摻Âø(doping)用»y5-51 4.1¡@熱擴散¸Ë置用»y5-51 4.2¡@¹p射摻Âø¸Ë置用»y5-52 4.3¡@等Â÷子Åé摻Âø¸Ë置用»y5-52 4.4¡@Â÷子注入¸Ë置用»y5-53 D.5¡@°h火³B理(annealing)用»y5-71 5.1¡@°h火³B理¸Ë置用»y5-71 D.6¡@抗»k劑³B理用»y5-77 6.1¡@塗敷¸Ë置用»y5-77 6.2¡@Åã影¸Ë置用»y5-86 6.3¡@烘焙¸Ë置用»y5-90 6.4¡@抗»k劑剝Â÷¸Ë置用»y5-92 D.7¡@曝光用»y5-94 7.1¡@曝光¸Ë置用»y5-95 D.8¡@»k刻用»y5-113 8.1¡@濕式»k刻¸Ë置用»y5-113 8.2¡@乾式»k刻¸Ë置用»y5-114 D.9¡@洗滌用»y5-133 9.1¡@濕式洗滌¸Ë置用»y5-133 9.2¡@乾式洗滌¸Ë置用»y5-150 9.3¡@乾燥¸Ë置用»y5-151 D.10¡@化學機械式拋光(CMP)用»y5-155 第六章¡@¸Ë°t工程用»y E.1¡@基本¡B共³q用»y6-3 E.2¡@切割(dicing)用»y6-15 2.1¡@晶圓固定¸Ë置用»y6-15 2.2¡@切割¸Ë置用»y6-15 2.3¡@劈¶}¸Ë置用»y6-23 E.3¡@接合(bonding)用»y6-24 3.1¡@晶片接合(die bonding)用»y6-25 3.2¡@引線接合(wire bonding)用»y6-33 3.3¡@無接線接合¸Ë置用»y6-50 E.4¡@封¸Ë(packaging)用»y6-54 4.1¡@樹¯×密封¸Ë置用»y6-54 4.2¡@密封¸Ë置用»y6-62 E.5¡@加工³B理用»y6-64 5.1¡@塑模溢料殘渣去°£¸Ë置用»y6-64 5.2¡@¾Z料³B理¸Ë置用»y6-66 5.3¡@引線加工機用»y6-67 E.6¡@打標印(marking)用»y6-70 6.1¡@油墨標印¸Ë置用»y6-70 6.2¡@¹p射標印¸Ë置用»y6-74 E.7¡@檢查µû價用»y6-77 第七章¡@檢查工程用»y F.1¡@基本共³q用»y7-3 1.1¡@共³q用»y7-3 1.2¡@測¸Õ¸Ë置用»y7-12 1.3¡@³B置(handling)¸Ë置用»y7-31 1.4¡@¦Ñ化³B理¸Ë置用»y7-32 F.2¡@測¸Õ(testing)用»y7-33 2.1¡@混Âø型測¸Õ¸Ë置用»y7-33 2.2¡@ÅÞ¿è測¸Õ(logic testing)¸Ë置用»y7-39 2.3¡@°O憶Åé測¸Õ(memory testing)¸Ë置用»y7-41 2.4¡@線性測¸Õ(linear testing)¸Ë置用»y7-46 2.5¡@影像感測器測¸Õ(image sensor testing)¸Ë置用»y7-49 2.6¡@¹q子波束測¸Õ(electron beam testing)¸Ë置用»y7-54 2.7¡@¹p射光束測¸Õ(laser beam testing)¸Ë置用»y7-56 F.3¡@加工³B理(handling)用»y7-57 3.1¡@晶圓加工³B理(wafer handling)¸Ë置用»y7-57 3.2¡@封¸ËÅé加工³B理(package handling)¸Ë置用»y7-66 F.4¡@¦Ñ化³B理(aging)用»y7-68 F.5¡@可¾a性檢查用»y7-75 第八章¡@³]備¡B環保工程用»y G.1¡@水用»y8-3 1.1¡@前置³B理¸Ë置用»y8-3 1.2¡@一次純水¸Ë置用»y8-11 1.3¡@¶W純水¸Ë置用»y8-21 1.4¡@廢水³B理¸Ë置用»y8-32 1.5¡@冷卻水用»y8-40 1.6¡@水½è分析儀器用»y8-44 G.2¡@ÃÄ劑用»y8-48 2.1¡@ÃÄ劑供應¸Ë置用»y8-48 2.2¡@ÃÄ品分析儀器用»y8-51 G.3¡@瓦斯用»y8-52 3.1¡@半導Åé用瓦斯用»y8-52 3.2¡@瓦斯供應系統用»y8-54 3.3¡@壓縮空氣¸Ë置用»y8-64 3.4¡@廢氣³B理¸Ë置用»y8-65 3.5¡@瓦斯分析儀器用»y8-68 G.4¡@潔淨室(clean room)用»y8-71 4.1¡@潔淨室³]備用»y8-71 4.2¡@控制監µø(controlling and monitoring)¸Ë置用»y8-94 4.3¡@潔淨室³]備用»y8-97 4.4¡@¹q力³]備用»y8-100 4.5¡@環境分析儀器用»y8-102 G.5¡@主n³]施用»y8-106 G.6¡@工廠¦Û動化(Factory Automation¡A簡稱FA)用»y8-116 6.1¡@¹q¸£一³e作戢cturing¡F簡稱CIM)8-116 6.2¡@¿é°e(transportation)¸Ë置用»y8-124 G.7¡@環保用»y8-131 ªþ¿ýªþ-1 A.參¦Ò¸ê料ªþ-3 ¡@¡@引用文獻一Äýªíªþ-3 ¡@¡@半導Åé»s³y¸Ë置之構成ªíªþ-3 光罩»s作工程¸Ë置之構成ªþ-4 晶圓»s³y工程¸Ë置之構成¡@ªþ-5 晶圓»s³y工程¸Ë置之構成¡@ªþ-6 晶圓³B理工程¸Ë置之構成¡@ªþ-7 晶圓³B理工程¸Ë置之構成¡@ªþ-8 晶圓³B理工程¸Ë置之構成¡@ªþ-9 晶圓³B理工程¸Ë置之構成¡@ªþ-10 ¸Ë°t工程¸Ë置之構成ªþ-11 檢查工程¸Ë置之構成ªþ-12 ³]備¡B環保工程¸Ë置之構成ªþ-13 B.^文用»y索引ªþ-14 ^文用»y縮寫»y索引ªþ-14 ^文用»y縮寫ªþ-14
¥b¾ÉÅé²£·~·§½×
¾÷¾¹¾Ç²ß¡G±q²z½×¨ì¹ê
¥b¾ÉÅé¿nÅé¹q¸ô»sµ{§Þ
LabVIEWµ{¦¡³]
¹q¤l¾Ç(°ò¦·§©À)(
¬Ý¹Ï¾ÇC»y¨¥»P¹Bºâ«ä
¹q¸£ºô»Úºô¸ô¡G¥Ñ¤W¦Ó
LabVIEW»P·P´ú
¹Ï¸Ñ¹qºÏ¾Ç¡G±q·§©À¨ì
¶W¹Ï¸Ñ¹q°Ê¨®ªººc³y»P
¬°¤F«O»Ù±zªºÅv¯q¡A·sµ·¸ôºô¸ô®Ñ©±©ÒÁʶRªº°Ó«~§¡¨É¦³¨ì³f¤C¤ÑªºÅ²½à´Á¡]§t¨Ò°²¤é¡^¡C°h¦^¤§°Ó«~¥²¶·©óŲ½à´Á¤º±H¦^¡]¥H¶lÂW©Î¦¬°õÁp¬°¾Ì¡^¡A¥B°Ó«~¥²¶·¬O¥þ·sª¬ºA»P§¹¾ã¥]¸Ë(°Ó«~¡Bªþ¥ó¡B¤º¥~¥]¸Ë¡BÀH³f¤å¥ó¡BÃØ«~µ¥)¡A§_«h®¤¤£±µ¨ü°h³f¡C